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Carl Zeiss and Synopsys Collaborate on In-Die Registration Metrology for Photomask Manufacturing

November 8, 2010
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JENA, Germany, Mountain View, CA-, Carl Zeiss SMS GmbH a supplier of photomask metrology and repair tools and Synopsys, Inc., a developer of software and semiconductor design, verification and manufacturing, announced a collaboration to support the ZEISS tool family for in–die metrology solutions.

Synopsys will offer support for ZEISS’ PROVE, the next-generation registration metrology tool, through Synopsys’ CATS, the mask data preparation solution.

“Synopsys’ collaboration with Carl Zeiss exemplifies our commitment to offering comprehensive lithography, inspection and metrology solutions to the mask manufacturing market”, said Fabio Angelillis, vice president of engineering for Synopsys’ Silicon Engineering Group. “By extending CATS to support PROVE, we are delivering higher quality metrology solutions to our customers at the 32-nanometer technology node and below.”

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