- THE MAGAZINE
- WEB EXCLUSIVES
This order is associated with the CSNE/SEMATECH consortium Micro Exposure Tool (MET-5) program that will help researchers achieve line widths of less than 16 nanometers in support of semiconductor roadmaps projected out to the year 2025.
Development and production is expected to take place throughout a 22-month period and will be carried out by Zygo's Extreme Precision Optics (EPO) operation in Richmond, CA.
"To be entrusted with this follow-on order for some of the finest EUV optics ever made is testimony to 20 years of accomplishment in this field," says Marc Tricard, executive director of business development at Zygo.