Quality Magazine

Asylum Research, University of Illinois Present Advanced AFM Workshop

February 24, 2012

SANTA BARBARA, CA-Asylum Research, a scanning probe and atomic force microscopy (SPM/AFM) technology company and the Frederick Seitz Materials Research Laboratory (FSMRL) at the University of Illinois Urbana Champaign (UIUC), announce The Advanced AFM Workshop on March 21-22, 2012.
 
The workshop will combine instructional lectures and tutorial instrument demonstrations, as well as tips, tricks and new techniques in Atomic Force Microscopy. Topics will include electrical characterization (conductive AFM, SKPM, EFM), Piezoresponse Force Microscopy (PFM), multifrequency techniques, new scanning techniques for nanomechanical characterization, and a tutorial on IGOR Pro software. UIUC researchers will also present current research on PFM, quantitative nanotube measurements, as well as combined AFM and Raman spectroscopy. In addition to UIUC personnel, the workshop is also open to all other researchers that want to learn more about these advanced AFM scanning techniques.

"There are over 200 AFM researchers and students using our instruments at UIUC’s FSMRL,” says Jason Cleveland, CEO of Asylum Research. “This is an excellent opportunity for us to educate, train and pass along our knowledge to both established and up and coming researchers as part of our continuing commitment to support the scientists of tomorrow. Exciting research is coming out of many departments at UIUC and we're very pleased that Asylum AFMs have been an important part of their scientific discoveries."

William L. Wilson, principal scientist and director of Central Facilities of the Frederick Seitz Materials Research Laboratory, notes, “As nanofabrication and nanoscale engineering move to the mainstream, the need for a wide array of analytical tools is apparent. Scanning probe microscopies like AFM which were once considered exotic research systems have become workhorse tools. It is extremely important that our user base continue to be conversant with the industry’s newest techniques and technologies. This workshop will provide a unique opportunity for researchers of all disciplines to learn how these techniques can transform their research.”

A registration fee of $40 will be charged for the workshop for lunches and breaks for both days. Attendees can register at mrl.illinois.edu/AFM2012 . Additional information and can be found at www.AsylumResearch.com/Events/UIUC2012 .