MorePeabody, Mass. -- JEOL USA announced today that Boston College has selected the new JEOL MultiBeam Focused Ion Beam system and a Field Emission Scanning Electron Microscope for its nanofabrication clean room facility in Newton, Massachusetts.
As a result of Boston College’s continued investment in the sciences, the university opened its first clean room (class 1,000/10,000), which will be equipped with the JEOL models JIB-4500 MultiBeam and JSM-7001F Scanning Electron Microscope with lithography capabilities.
The 4,000-square-foot lab is poised to elevate Boston College to a leadership position in this cutting-edge research into materials, energy and technology that are making an impact on fields as diverse as chemistry, physics, computing, medicine, and energy conservation. The new BC nanofabrication lab, supervised by Stephen Shepard, will integrate the new MultiBeam nanofabrication tool with a field emission scanning electron microscope/electron beam lithography tool to conduct both fabrication and imaging.
The MultiBeam is a high throughput Scanning Electron Microscope/Focused Ion Beam combination tool for IC defect analysis, circuit modification, TEM thin film sample preparation, mask repair and myriad other uses in nanoscale science and technology. The field emission SEM, a model JSM-7001F, has both the capability of ultrahigh resolution imaging and nanoscale lithography. With these two instruments, the new research facility will be able to fabricate, manipulate and directly measure properties of nanoscale devices visible only at high magnifications.
As a result of Boston College’s continued investment in the sciences, the university opened its first clean room (class 1,000/10,000), which will be equipped with the JEOL models JIB-4500 MultiBeam and JSM-7001F Scanning Electron Microscope with lithography capabilities.
The 4,000-square-foot lab is poised to elevate Boston College to a leadership position in this cutting-edge research into materials, energy and technology that are making an impact on fields as diverse as chemistry, physics, computing, medicine, and energy conservation. The new BC nanofabrication lab, supervised by Stephen Shepard, will integrate the new MultiBeam nanofabrication tool with a field emission scanning electron microscope/electron beam lithography tool to conduct both fabrication and imaging.
The MultiBeam is a high throughput Scanning Electron Microscope/Focused Ion Beam combination tool for IC defect analysis, circuit modification, TEM thin film sample preparation, mask repair and myriad other uses in nanoscale science and technology. The field emission SEM, a model JSM-7001F, has both the capability of ultrahigh resolution imaging and nanoscale lithography. With these two instruments, the new research facility will be able to fabricate, manipulate and directly measure properties of nanoscale devices visible only at high magnifications.
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