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Quality News

INDUSTRY HEADLINE

Olympus Hosts Tech Day at Smithsonian’s National Museum of Natural History

December 8, 2014

CENTER VALLEY, PA — Industrial imaging device maker Olympus hosted a Microscopy and Optical Metrology Workshop on Nov. 19.

Keynote speaker and featured industry expert Chris Brown, PE, FASME, provided insight on roughness for science and conservation through topics that included surface roughness, 3D imaging and digital microscopy.

Products available for exclusive demonstration included:

• Olympus Lext OLS4100 laser confocal microscope system, designed to deliver nanometer-level imaging, accurate 3D measurement and surface roughness analysis. The OLS4100 features new auto brightness and high-speed stitching modes.

• OLYMPUS DSX500 and DSX100 microscope systems combines cutting-edge optical performance with the operational convenience of a smartphone or tablet, allowing users to easily create, process, and share high-resolution digital images.

The event was held at the Smithsonian’s National Museum of Natural History's Q?rius (pronounced curious) exhibit, an interactive and experimental learning space, as part of an initiative to bring solutions and technology to expert institutions.

Olympus is supporting the 10,000-square-foot Q?rius exhibit with a donation more than 50 microscopes and imaging systems that enables museum visitors, along with remote participants, to access research objects in the Smithsonian NMNH’s collection as they participate in active, ongoing scientific inquiry. Users are coached and mentored in using the equipment by Smithsonian scientists and trained educator-volunteers.

For more information, visit olympus-ims.com.

KEYWORDS: microscopy Microscopy Markets Microscopy Technologies optical metrology

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