SPIE Optical Metrology Announces Call for Papers
CARDIFF, England- New research
in optical measurement technologies enabling applications in industry, research
modeling, inspection of nanostructures and artwork, and related topics will be
presented at SPIE Optical
Metrology , May 24 – 26, 2011.
The conference will be held at the International Conference Centre Munich in conjunction with Laser World of Photonics.
SPIE Optical Metrology is the field’s premier conference in Europe for scientists, engineers, researchers, and applications or product developers, noted symposium chairs Wolfgang Osten, Universiteit Stuttgart; Malgorzata Kujawinska, Warsaw University of Technology; and Pietro Ferraro, Istituto Nazionale di Ottica Applicata.
Abstracts may be submitted through Nov. 15 for four conferences. They include:
“Optical Measurement Systems for Industrial Inspection,”
chaired by Peter Lehmann, Universiteit Kassel, on optical metrology methods and
their applications in solving measurement problems in industrial design and
production engineering.
“Modeling Aspects in Optical Metrology,” chaired by
Bernd Bodermann, Physikalisch-Technische Bundesanstalt, on optical metrology
modelling as a prerequisite for traceable and comparable measurements.
“Optics for Arts, Architecture and Archaeology,” chaired
by Luca Pezzati, Istituto Nazionale di Ottica Applicata, and Reno Salimbeni,
Istituto di Fisica Applicata Nello Carrara, on advanced optical methodologies
for the study, documentation, safeguard, preservation and conservation of
cultural heritage.
“Videometrics, Range Imaging and Applications,”
chaired by Fabio Remondino, Fondazione Bruno Kessler and Mark Shortis, RMIT
University, on advances in precise 3-D measurement and accurate modeling from
imaging and range sensors.
Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections. The SPIE Digital Library is the world’s largest collection of optics and photonics literature and a leading resource for scientific and patent research.
Along with SPIE Optical Metrology, the biennial World of Photonics Congress includes conferences organized by the German Scientific Laser Society, European Optical Society, IEEE Photonics Society and the European Physical Society.
The conference will be held at the International Conference Centre Munich in conjunction with Laser World of Photonics.
SPIE Optical Metrology is the field’s premier conference in Europe for scientists, engineers, researchers, and applications or product developers, noted symposium chairs Wolfgang Osten, Universiteit Stuttgart; Malgorzata Kujawinska, Warsaw University of Technology; and Pietro Ferraro, Istituto Nazionale di Ottica Applicata.
Abstracts may be submitted through Nov. 15 for four conferences. They include:
Accepted papers will be published in the SPIE Digital Library as soon as approved after the meeting, and in print volumes and digital collections. The SPIE Digital Library is the world’s largest collection of optics and photonics literature and a leading resource for scientific and patent research.
Along with SPIE Optical Metrology, the biennial World of Photonics Congress includes conferences organized by the German Scientific Laser Society, European Optical Society, IEEE Photonics Society and the European Physical Society.
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